Issue 7, 2004
From the journal:

Chemical Communications

UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

Alison Y. Cheng,a   Scott B. Clendenning,a   Guocheng Yang,b   Zheng-Hong Lu,c   Christopher M. Yipb  and  Ian Manners*a  

* Corresponding authors

a Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, Canada
E-mail: imanners@alchemy.chem.utoronto.ca

b Department of Chemical Engineering and Applied Chemistry, Institute of Biomaterials and Biomedical Engineering, University of Toronto, Toronto, Ontario, Canada

c Department of Materials Science and Applied Chemistry, University of Toronto, Ontario, Canada

Abstract

Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 µm. Pyrolysis of the patterned polymer at 900 °C under a N2 atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.

Graphical abstract: UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

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Article information

DOI
https://doi.org/10.1039/B316656B
Article type
Communication
Submitted
23 Dec 2003
Accepted
06 Feb 2004
First published
03 Mar 2004

Chem. Commun., 2004, 780-781

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UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

A. Y. Cheng, S. B. Clendenning, G. Yang, Z. Lu, C. M. Yip and I. Manners, Chem. Commun., 2004, 780 DOI: 10.1039/B316656B

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