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Issue 7, 2004
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UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

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Abstract

Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 µm. Pyrolysis of the patterned polymer at 900 °C under a N2 atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.

Graphical abstract: UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

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Publication details

The article was received on 23 Dec 2003, accepted on 06 Feb 2004 and first published on 03 Mar 2004


Article type: Communication
DOI: 10.1039/B316656B
Citation: Chem. Commun., 2004, 780-781
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    UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

    A. Y. Cheng, S. B. Clendenning, G. Yang, Z. Lu, C. M. Yip and I. Manners, Chem. Commun., 2004, 780
    DOI: 10.1039/B316656B

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