Issue 24, 2002
From the journal:

Chemical Communications

Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: a model study

John M. Klopp,a   Nicolas Bensel,a   Zachary M. Frescoa  and  Jean M. J. Fréchet*a  

* Corresponding authors

a Department of Chemistry, University of California, Berkeley, CA
E-mail: http://www.frechet.com/ E-mail: frechet@cchem.berkeley.edu
Fax: +510 643 3079
Tel: +510 643 3078

Abstract

An acid catalysed rearrangement that transforms a bicyclic lactone into a phenolic carboxylic acid has been tested for potential use in chemically amplified microlithographic imaging.

About
Cited by
Related
Download options Please wait...

Article information

DOI
https://doi.org/10.1039/B209695A
Article type
Communication
Submitted
04 Oct 2002
Accepted
29 Oct 2002
First published
13 Nov 2002

Chem. Commun., 2002, 2956-2957

Permissions

Request permissions

Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: a model study

J. M. Klopp, N. Bensel, Z. M. Fresco and J. M. J. Fréchet, Chem. Commun., 2002, 2956 DOI: 10.1039/B209695A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements