Advances in Direct Optical Lithography of Nanomaterials

Abstract

The precise assembly of nanomaterials is essential for integrating nanomaterials into sophisticated devices. However, the conventional nanoscale patterning methods face obstacles such as high-cost, low-resolution, and environmental contamination. Direct optical lithography can offer a promising alternative by leveraging the photochemical reactions of ligands, eliminating the need for photoresists. This approach simplifies the lithography process, reduces costs, and minimizes the environmental impact. In this review, we begin with an in-depth analysis of the evolution of optical lithography and key optical pattern strategies. We then emphasize how advanced nanomaterials, such as quantum dots, metal oxides, metals, clusters, and MOFs, contribute to precise patterning for electronic and optoelectronic applications. Finally, we discuss current challenges in this field and proposed solutions to improve patterning efficiency and quality while addressing issues about environmental sustainability.