The deployment of an NOTT-300 (Al) MOF thin film as a NO2 capacitive sensor under ambient conditions

Mohamed Rachid Tchalala; Osama Shekhah; Youssef Belmabkhout; Hao Jiang; Khaled N. Salama; Mohamed Eddaoudi

doi:10.1039/D4MA00701H

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The deployment of an NOTT-300 (Al) MOF thin film as a NO₂ capacitive sensor under ambient conditions†

Mohamed Rachid Tchalala,^a Osama Shekhah,

^a Youssef Belmabkhout,^a Hao Jiang,

^a Khaled N. Salama

*^b and Mohamed Eddaoudi

*^a

Author affiliations

* Corresponding authors

^a Functional Materials Design, Discovery, and Development Research Group (FMD3), Advanced Membranes and Porous Materials Center (AMPMC), Division of Physical Sciences and Engineering (PSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Kingdom of Saudi Arabia
E-mail: mohamed.eddaoudi@kaust.edu.sa

^b Sensors Lab, Advanced Membranes & Porous Materials Centre (AMPMC), Division of Computer, Electrical and Mathematical Sciences and Engineering (CEMSE), King Abdullah University of Science and Technology (KAUST), Thuwal, Kingdom of Saudi Arabia

Abstract

Herein we report on the fabrication of a metal–organic framework (MOF)-based sensor using an NOTT-300 (Al) MOF thin film, deposited as a sensing layer on an interdigitated capacitive electrode (IDE), and deploy it for the detection of nitrogen dioxide (NO₂) at room temperature. The fabricated MOF-based sensor was tested and it demonstrated a significant detection sensitivity for NO₂ with concentrations down to 250 ppb, with a lower detection limit around 4.0 ppb. The NOTT-300 (Al) MOF sensor also displayed an outstanding NO₂ sensing stability and a highly desirable detection selectivity towards NO₂vs. other common gases such CO₂ and H₂O as well.

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Article information

DOI: https://doi.org/10.1039/D4MA00701H
Article type: Paper
Submitted: 10 Jul 2024
Accepted: 09 Aug 2024
First published: 02 Sep 2024
This article is Open Access

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Mater. Adv., 2024,5, 7413-7418

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The deployment of an NOTT-300 (Al) MOF thin film as a NO₂ capacitive sensor under ambient conditions

M. R. Tchalala, O. Shekhah, Y. Belmabkhout, H. Jiang, K. N. Salama and M. Eddaoudi, Mater. Adv., 2024, 5, 7413 DOI: 10.1039/D4MA00701H

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