Liquid-Phase Intermediated Chemical Vapor Deposition for Ternary Compositional 1D van der Waals Material Nb2Pd3Se8

Abstract

In the case of low-dimensional semiconductor devices, the basic physical properties of materials can be measured through device manufacturing using single crystal synthesis and exfoliation, but for expansion into various application fields, technology that can synthesize the material itself directly on the substrate is needed. For multi-composition low-dimensional semiconductor materials like Nb2Pd3Se8, the physical characteristics of constituent elements differ, making direct growth control on substrate extremely challenging. This study successfully synthesized Nb2Pd3Se8 wires using different metal precursors (niobium and palladium) through liquid precursor–intermediated chemical vapor deposition (LPI-CVD). By adjusting the concentration of the liquid precursor and the synthesis temperature, the reproducible growth of Nb2Pd3Se8 wires was achieved, ranging in lengths from 2.29 to 15.04 μm. It was confirmed that PdSe2 is initially synthesized at lower temperatures (below 620 °C), and at temperatures above 620 °C, this PdSe2 transforms into Pd17Se15. Nb2Pd3Se8 is synthesized from the Pd17Se15 at these higher temperatures. X-ray diffraction (XRD) analysis revealed that the wires exhibit a preferred orientation along the (210) plane. Electronic device fabrication using these wires demonstrated their application potential as n-type semiconductors. Field-effect transistor (FET) measurements revealed remarkable performance, with an Ion/Ioff ratio of 575 and an electron mobility of 2.03 cm² V⁻¹ s⁻¹. LPI-CVD provides a promising strategy for synthesizing ternary chalcogenide materials, opening possibilities for exploring diverse ternary phases. This study highlights the importance of controllability, reproducibility, and FET performance in growing Nb2Pd3Se8 wires via the CVD system, thereby paving the way for integrated applications and facilitating mixed-dimensional studies with other nanomaterials.

Supplementary files

Article information

Article type
Paper
Submitted
07 May 2024
Accepted
25 Jul 2024
First published
27 Jul 2024
This article is Open Access
Creative Commons BY-NC license

CrystEngComm, 2024, Accepted Manuscript

Liquid-Phase Intermediated Chemical Vapor Deposition for Ternary Compositional 1D van der Waals Material Nb2Pd3Se8

S. H. Lee, B. J. Jeong, K. H. Choi, J. Jeon, B. Lee, S. Cho, D. Kim, G. T. Gudena, D. D. Megersa, S. H. Kim, H. K. Yu and J. Choi, CrystEngComm, 2024, Accepted Manuscript , DOI: 10.1039/D4CE00451E

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements