Issue 12, 2023

Synthesis of highly-uniform titania overcoats on a mesoporous alumina catalyst support by atomic layer deposition and their application in hydroprocessing

Abstract

The feasibility of gas phase deposition using a Ti alkoxide precursor for precise surface modification of catalysts was demonstrated by modifying a mesoporous alumina support with a Ti oxide overcoat. Titanium tetra-isopropoxide yields a Ti oxide layer that covers homogeneously the alumina surface. Uniformity of the deposited TiO2 was verified by SEM-EDX, on both intra-particle and inter-particle levels. Only a few atomic layer deposition (ALD) cycles were required in order to obtain Ti contents with a relevance for industrial application. The pore size distribution of the overcoated catalyst support was barely affected by the coating process. Synthesized CoMo catalysts based on the Ti-alumina carrier showed up to 40% higher activity compared to a catalyst supported on pristine alumina, in hydroprocessing under industrial testing conditions. The TiO2 coating appeared to be stable, showing no agglomeration characteristics after reaction as corroborated by TEM-EDX. ALD provides a scalable route with low waste generation for the production of precisely structured TiO2–Al2O3 hydroprocessing catalyst supports.

Graphical abstract: Synthesis of highly-uniform titania overcoats on a mesoporous alumina catalyst support by atomic layer deposition and their application in hydroprocessing

Supplementary files

Article information

Article type
Paper
Submitted
08 Mar 2023
Accepted
17 May 2023
First published
23 May 2023
This article is Open Access
Creative Commons BY license

Catal. Sci. Technol., 2023,13, 3537-3544

Synthesis of highly-uniform titania overcoats on a mesoporous alumina catalyst support by atomic layer deposition and their application in hydroprocessing

J. A. Moulijn, J. R. van Ommen, A. Goulas, D. Valdesueiro, J. Juan-Alcañiz, K. Au-Yeung, L. Woning and J. A. Bergwerff, Catal. Sci. Technol., 2023, 13, 3537 DOI: 10.1039/D3CY00335C

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