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Issue 8, 2018, Issue in Progress
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Nanotextured Si surfaces derived from block-copolymer self-assembly with superhydrophobic, superhydrophilic, or superamphiphobic properties

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Abstract

We demonstrate the use of wafer-scale nanolithography based on block-copolymer (BCP) self-assembly for the fabrication of surfaces with enhanced wetting properties. All classes of wetting behaviour derived from the same BCP nanolithography step are demonstrated. An in situ etch mask is defined by self-assembly of polystyrene (PS) and dimethylsiloxane (PDMS) domains to form a predominantly hexagonal array with pitch size (72 ± 3) nm. The subsequent branched processing scheme, exclusively employing dry chemistry and reactive ion etching (RIE), allows the fabrication of nanoholes, nanopillars, or high aspect ratio nano-hoodoo features (overhang profile structures) with a diameter below 100 nm. The surfaces are finally functionalized with either hydrophobic surface chemistry by self-assembly from the precursor perfluorodecyltrichlorosilane (FDTS), or hydrophilic surface chemistry obtained by oxygen plasma treatment. The different texture and surface chemistry configurations are characterized with respect to their wetting properties with water, alkanes and organic oils. While, both nano-pillar and nano-hole surfaces feature excellent superhydrophobic properties with water contact angles (WCAs) exceeding 170° and roll-off angles below 5°, only the nano-pillar surfaces exhibit convincing superhydrophilicity with WCAs below 5°. The repellency of low surface tension liquids known as amphiphobicity is demonstrated for the nano-hoodoo surfaces.

Graphical abstract: Nanotextured Si surfaces derived from block-copolymer self-assembly with superhydrophobic, superhydrophilic, or superamphiphobic properties

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Publication details

The article was received on 14 Jan 2018, accepted on 16 Jan 2018 and first published on 22 Jan 2018


Article type: Paper
DOI: 10.1039/C8RA00414E
Citation: RSC Adv., 2018,8, 4204-4213
  • Open access: Creative Commons BY-NC license
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    Nanotextured Si surfaces derived from block-copolymer self-assembly with superhydrophobic, superhydrophilic, or superamphiphobic properties

    A. Telecka, T. Li, S. Ndoni and R. Taboryski, RSC Adv., 2018, 8, 4204
    DOI: 10.1039/C8RA00414E

    This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. Material from this article can be used in other publications provided that the correct acknowledgement is given with the reproduced material and it is not used for commercial purposes.

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      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the Centre National de la Recherche Scientifique (CNRS) and the RSC.
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      [Original citation] - Published by the PCCP Owner Societies.
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      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the European Society for Photobiology, the European Photochemistry Association, and RSC.
    • For reproduction of material from all other RSC journals:
      [Original citation] - Published by The Royal Society of Chemistry.

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