Jump to main content
Jump to site search

Issue 8, 2017, Issue in Progress
Previous Article Next Article

Room-temperature pulsed CVD-grown SiO2 protective layer on TiO2 particles for photocatalytic activity suppression

Author affiliations

Abstract

This work presents a novel chemical vapor deposition (CVD) approach that enables the deposition of ultrathin and conformal SiO2 layers on TiO2 anatase nanoparticles at room temperature using SiCl4 and air containing water without the use of a catalyst. The morphology of the CVD-grown SiO2 layers was found to be strongly dependent on the initial surface states of the TiO2 nanopowders, which could be altered by applying a simple heat pretreatment. The deposition on untreated TiO2 resulted in granular films, whereas on preheated TiO2 highly uniform and conformal SiO2 layers were obtained. By varying the SiCl4 precursor dosing time and the number of CVD cycles, the thickness of the SiO2 could be controlled at the nanometer level, which allowed us to investigate the influence of film thickness on the photocatalytic suppression ability. We found that a conformal SiO2 layer with a thickness of 3 nm could sufficiently suppress the photocatalytic activity of anatase TiO2 nanoparticles, which was demonstrated by the photodegradation of Rhodamine B. Our approach offers a simple, fast, feasible and low-temperature deposition method which can be directly applied to SiO2 coating on nanoparticles in pigments and other fields, particularly heat-sensitive materials, and further developed for large-scale production.

Graphical abstract: Room-temperature pulsed CVD-grown SiO2 protective layer on TiO2 particles for photocatalytic activity suppression

Back to tab navigation

Publication details

The article was received on 09 Dec 2016, accepted on 03 Jan 2017 and first published on 16 Jan 2017


Article type: Paper
DOI: 10.1039/C6RA27976G
Citation: RSC Adv., 2017,7, 4547-4554
  • Open access: Creative Commons BY-NC license
  •   Request permissions

    Room-temperature pulsed CVD-grown SiO2 protective layer on TiO2 particles for photocatalytic activity suppression

    J. Guo, S. Yuan, Y. Yu, J. R. van Ommen, H. Van Bui and B. Liang, RSC Adv., 2017, 7, 4547
    DOI: 10.1039/C6RA27976G

    This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. Material from this article can be used in other publications provided that the correct acknowledgement is given with the reproduced material and it is not used for commercial purposes.

    Reproduced material should be attributed as follows:

    • For reproduction of material from NJC:
      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the Centre National de la Recherche Scientifique (CNRS) and the RSC.
    • For reproduction of material from PCCP:
      [Original citation] - Published by the PCCP Owner Societies.
    • For reproduction of material from PPS:
      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the European Society for Photobiology, the European Photochemistry Association, and RSC.
    • For reproduction of material from all other RSC journals:
      [Original citation] - Published by The Royal Society of Chemistry.

    Information about reproducing material from RSC articles with different licences is available on our Permission Requests page.

Search articles by author

Spotlight

Advertisements