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Issue 25, 2017
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Programmable graphene doping via electron beam irradiation

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Graphene is a promising candidate to succeed silicon based devices, and the conventional strategies for fabrication and testing of graphene-based electronics often utilise an electron beam. Here, we report on a systematic study of the effect of electron beam exposure on graphene devices. We realise reversible doping of on-chip graphene using a focused electron beam. Our results demonstrate site-specific control of carrier type and concentration achievable by modulating the charge distribution in the substrate. The effect of substrate-embedded charges on carrier mobility and conductivity of graphene is studied, with a dielectric screening model proposed to explain the effective n-type and p-type doping produced at different beam energies. Multiple logic operations are thus implemented in a single graphene sheet by using site-specific e-beam irradiation. We extend the phenomenon to MoS2, generalising it to conductive two-dimensional materials. Our results are of importance to imaging, in situ characterisation and lithographic techniques employed to investigate 2D materials.

Graphical abstract: Programmable graphene doping via electron beam irradiation

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The article was received on 15 May 2017, accepted on 04 Jun 2017 and first published on 07 Jun 2017

Article type: Paper
DOI: 10.1039/C7NR03446F
Citation: Nanoscale, 2017,9, 8657-8664
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    Programmable graphene doping via electron beam irradiation

    Y. Zhou, J. Jadwiszczak, D. Keane, Y. Chen, D. Yu and H. Zhang, Nanoscale, 2017, 9, 8657
    DOI: 10.1039/C7NR03446F

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