Issue 10, 2017

Controlling the orientations of h-BN during growth on transition metals by chemical vapor deposition

Abstract

Hexagonal boron nitride (h-BN) is crucial for many applications, and its synthesis over a large area with high quality is strongly desired. A promising approach to synthesize h-BN is chemical vapor deposition on transition metal catalysts, in which the alignments of BN clusters in the initial growth determine both the types and the amounts of defects in h-BN. In the search for a better catalyst, we systematically studied the interactions between h-BN clusters and various metal surfaces. Our results show that the clusters on nearly all catalyst surfaces, no matter whether the (111) facets of face-centered cubic (FCC) metals or the (0001) facets of hexagonal close packed (HCP) metals, have two local minima with opposite orientations. During the initial growth, h-BN clusters adopt the energy-favored sites, whose registry is well preserved upon further growth owing to the strong interaction between the edge atoms of h-BN and the underlying substrates. On FCC(111), the h-BN domains are always aligned in parallel orientations, while on HCP(0001) they are parallel on the same terrace and anti-parallel on neighboring terraces. Beyond this, on the (111) surfaces of Ir and Rh, the BhNt configuration is much more energy favorable than BfNt, where, the subscripts h, t, and f represent the adsorption sites, hcp, top and fcc, respectively. Thus, Ir(111) and Rh(111) might promote the growth of h-BN domains with the same alignments, which will greatly improve the quality of h-BN by reducing the possibility of formation of grain boundaries.

Graphical abstract: Controlling the orientations of h-BN during growth on transition metals by chemical vapor deposition

Supplementary files

Article information

Article type
Paper
Submitted
02 Dec 2016
Accepted
10 Feb 2017
First published
10 Feb 2017

Nanoscale, 2017,9, 3561-3567

Controlling the orientations of h-BN during growth on transition metals by chemical vapor deposition

R. Zhao, X. Zhao, Z. Liu, F. Ding and Z. Liu, Nanoscale, 2017, 9, 3561 DOI: 10.1039/C6NR09368J

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