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Issue 5, 1988
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Thermal deposition of TiS films from volatile Ti(SBut)4

Abstract

Amorphous films of TiS are deposited by the low-pressure vapour-phase thermolysis of Ti(SBut)4 at 130–200 °C.

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Article type: Paper
DOI: 10.1039/C39880000344
Citation: J. Chem. Soc., Chem. Commun., 1988, 344-345
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    Thermal deposition of TiS films from volatile Ti(SBut)4

    M. Bochmann, I. Hawkins and L. M. Wilson, J. Chem. Soc., Chem. Commun., 1988, 344
    DOI: 10.1039/C39880000344

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