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Issue 23, 2017
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Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

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Abstract

Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C–N bond in CH3NO2 and the formation of a Si–CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).

Graphical abstract: Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

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Publication details

The article was received on 15 Dec 2016, accepted on 30 Jan 2017 and first published on 01 Feb 2017


Article type: Communication
DOI: 10.1039/C6CC09961K
Citation: Chem. Commun., 2017,53, 3342-3345
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    Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

    X. Zhang, C. Wang, W. Ji and S. Ptasinska, Chem. Commun., 2017, 53, 3342
    DOI: 10.1039/C6CC09961K

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