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Journal of Materials Chemistry C

Materials for optical, magnetic and electronic devices

Paper

Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor

*
Corresponding authors
a
Department of Mechanical Engineering, Stanford University, USA
E-mail: shinjita@stanford.edu, jtorgers@stanford.edu
b
Department of Material Science and Engineering, Stanford University, USA
c
Department of Chemistry, Stanford University, USA
d
BASF Corporation, Union, USA
e
California Research Alliance (CARA), BASF Corporation, Berkeley, USA
J. Mater. Chem. C, 2016,4, 1945-1952

DOI: 10.1039/C5TC03561A
Received 29 Oct 2015, Accepted 21 Dec 2015
First published online 22 Dec 2015
This article is licensed under a Creative Commons Attribution 3.0 Unported Licence.
Open Access
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Supplementary Info