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Journal of Materials Chemistry C

Materials for optical, magnetic and electronic devices


Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor

Corresponding authors
Department of Mechanical Engineering, Stanford University, USA
E-mail: shinjita@stanford.edu, jtorgers@stanford.edu
Department of Material Science and Engineering, Stanford University, USA
Department of Chemistry, Stanford University, USA
BASF Corporation, Union, USA
California Research Alliance (CARA), BASF Corporation, Berkeley, USA
J. Mater. Chem. C, 2016,4, 1945-1952

DOI: 10.1039/C5TC03561A
Received 29 Oct 2015, Accepted 21 Dec 2015
First published online 22 Dec 2015
This article is licensed under a Creative Commons Attribution 3.0 Unported Licence.
Open Access
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