Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance work on Tuesday 19th September 2017 from 8.00am to 4.00pm (BST).

During this time our website performance may be temporarily affected. If you have any questions please use the feedback button available under our menu button. We apologise for any inconvenience this might cause and thank you for your patience.


Issue 24, 2016
Previous Article Next Article

A wafer-scale antireflective protection layer of solution-processed TiO2 nanorods for high performance silicon-based water splitting photocathodes

Author affiliations

Abstract

Sustainable and efficient conversion of solar energy to transportable green energy and storable fuels, hydrogen, represents a solution to the energy crisis and reduces the consumption of fossil fuels, which are mainly responsible for the rise in global temperature. Solar water splitting using semiconductors, such as silicon, is promising to satisfy the global energy demand by producing hydrogen molecules. However, the solar to hydrogen conversion efficiency of a silicon photoelectrode is suppressed by overpotential, high reflectance and/or instability in liquid electrolytes. Herein, we report the synthesis of multifunctional solution-processed TiO2 nanorods on a 4-inch p-silicon wafer with controllable heights and diameters for highly efficient water splitting photocathodes. The solution-processed passivation layer of TiO2 nanorods reduces the overpotential of the silicon photocathode due to its catalytic properties. The TiO2 NRs also dramatically improves the light absorption of silicon due to the antireflective ability of the nanorods. The reflectance of silicon is decreased from 37.5% to 1.4% and enhances the saturated photocurrent density. The Pt-decorated (1–2.5 nm diameter) TiO2 nanorods/p-Si photocathodes show a short circuit current density of up to 40 mA cm−2, an open circuit voltage ∼440 mV and incident photon to current conversion efficiency of >90% using 0.5 M H2SO4 electrolyte with simulated 1 sun irradiation. The heterostructure photocathodes are stable for more than 52 h without noticeable degradation and an ideal regenerative cell efficiency of 2.5% is achieved.

Graphical abstract: A wafer-scale antireflective protection layer of solution-processed TiO2 nanorods for high performance silicon-based water splitting photocathodes

Back to tab navigation

Supplementary files

Publication details

The article was received on 11 Apr 2016, accepted on 18 May 2016 and first published on 18 May 2016


Article type: Paper
DOI: 10.1039/C6TA02987F
Citation: J. Mater. Chem. A, 2016,4, 9477-9485
  •   Request permissions

    A wafer-scale antireflective protection layer of solution-processed TiO2 nanorods for high performance silicon-based water splitting photocathodes

    D. M. Andoshe, S. Choi, Y. Shim, S. H. Lee, Y. Kim, C. W. Moon, D. H. Kim, S. Y. Lee, T. Kim, H. K. Park, M. G. Lee, J. Jeon, K. T. Nam, M. Kim, J. K. Kim, J. Oh and H. W. Jang, J. Mater. Chem. A, 2016, 4, 9477
    DOI: 10.1039/C6TA02987F

Search articles by author

Spotlight

Advertisements