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Issue 11, 2016
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Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

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Abstract

We report a study on directed self-assembly (DSA) with solvent annealing to induce the formation of non-bulk block copolymer microdomains on chemical patterns. Ultrathin films of symmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) display morphologies of PMMA dots, stripes, and PS hexagons with increasing exposure time to acetone vapor, a PMMA-selective solvent. All three nanostructures form long-range-ordered and registered arrays on striped chemical patterns with periods (LS) commensurate to the solvated PS-b-PMMA microdomain period (L0,s). Solvent annealing is shown to facilitate DSA on non-regular chemical patterns, on which the local periods are incommensurate to L0,s. DSA with feature density multiplication, via solvent annealing, is also demonstrated.

Graphical abstract: Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

  • This article is part of the themed collection: Polymers
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Publication details

The article was received on 17 Nov 2015, accepted on 10 Feb 2016 and first published on 11 Feb 2016


Article type: Paper
DOI: 10.1039/C5SM02829A
Author version available: Download Author version (PDF)
Citation: Soft Matter, 2016,12, 2914-2922
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    Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

    L. Wan, S. Ji, C. Liu, G. S. W. Craig and P. F. Nealey, Soft Matter, 2016, 12, 2914
    DOI: 10.1039/C5SM02829A

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