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Issue 52, 2016, Issue in Progress
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A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via a micro patterned X-ray mask

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Abstract

Micro- and nanofluidic devices are being used increasingly in biological, chemical, and medical applications, and many fabrication methods have been proposed. While micro-sized structures are simply fabricated using standard ultraviolet (UV) lithography processes, there are still limitations in the fabrication of nano-sized structures. This study presents a novel X-ray mask fabrication method for fabricating extremely long nano-sized channels using synchrotron radiation (width and height: ∼200 nm, length: ∼2 cm). The X-ray mask used for manufacturing the nano-sized channels can simply be fabricated by depositing metal on microstructures tilted at a specific angle. The proposed method overcomes the limitations of traditional nanofabrication methods, which are complex, expensive, and time-consuming. Using the fabricated nanochannels, the generation of ion concentration polarization, a novel transport phenomenon in nanofluidics, was investigated. Our novel fabrication method should be a useful tool for various nanofluidic applications due to its various advantages, including simple fabrication process, controllability, and duplicability.

Graphical abstract: A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via a micro patterned X-ray mask

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Publication details

The article was received on 04 Apr 2016, accepted on 29 Apr 2016 and first published on 03 May 2016


Article type: Paper
DOI: 10.1039/C6RA08657H
Citation: RSC Adv., 2016,6, 46068-46072
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    A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via a micro patterned X-ray mask

    H. Jeon, J. H. Kim and G. Lim, RSC Adv., 2016, 6, 46068
    DOI: 10.1039/C6RA08657H

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