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Issue 19, 2016
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Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

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Abstract

Self-assembly gold nanostructured membranes are created to mechanically stabilize the catalyst movement during metal assisted chemical etching. This results in an improved vertical control of the etching profile for high aspect ratio silicon microstructures. The new method is a robust and cheap microfabrication for dense micro-patterns on a large area, such as diffraction gratings for hard X-ray phase contrast imaging and metrology.

Graphical abstract: Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

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The article was received on 24 Nov 2015, accepted on 24 Jan 2016 and first published on 08 Feb 2016


Article type: Communication
DOI: 10.1039/C5RA24947C
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Citation: RSC Adv., 2016,6, 16025-16029
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    Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

    L. Romano, M. Kagias, K. Jefimovs and M. Stampanoni, RSC Adv., 2016, 6, 16025
    DOI: 10.1039/C5RA24947C

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