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Issue 22, 2016
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Highly conformal fabrication of nanopatterns on non-planar surfaces

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Abstract

While the number of techniques for patterning materials at the nanoscale exponentially increases, only a handful of methods approach the conformal patterning of strongly non-planar surfaces. Here, using the direct surface self-assembly of colloids by electrostatics, we produce highly conformal bottom-up nanopatterns with a short-range order. We illustrate the potential of this approach by devising functional nanopatterns on highly non-planar substrates such as pyramid-textured silicon substrates and inherently rough polycrystalline films. We further produce functionalized polycrystalline thin-film silicon solar cells with enhanced optical performance. The perspective presented here to pattern essentially any surface at the nanoscale, in particular surfaces with high inherent roughness or with microscale features, opens new possibilities in a wide range of advanced technologies from affordable photovoltaics and optoelectronics to cellular engineering.

Graphical abstract: Highly conformal fabrication of nanopatterns on non-planar surfaces

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Publication details

The article was received on 27 Jan 2016, accepted on 28 Apr 2016 and first published on 04 May 2016


Article type: Paper
DOI: 10.1039/C6NR00749J
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Citation: Nanoscale, 2016,8, 11461-11466
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    Highly conformal fabrication of nanopatterns on non-planar surfaces

    I. Massiot, C. Trompoukis, K. Lodewijks, V. Depauw and A. Dmitriev, Nanoscale, 2016, 8, 11461
    DOI: 10.1039/C6NR00749J

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