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Issue 2, 2016
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Engineering on-chip nanoporous gold material libraries via precision photothermal treatment

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Abstract

Libraries of nanostructured materials on a single chip are a promising platform for high throughput and combinatorial studies of structure–property relationships in the fields of physics and biology. Nanoporous gold (np-Au), produced by an alloy corrosion process, is a nanostructured material specifically suited for such studies because of its self-similar thermally induced coarsening behavior. However, traditional heat application techniques for the modification of np-Au are bulk processes that cannot be used to generate a library of different pore sizes on a single chip. Here, laser micro-processing offers an attractive solution to this problem by providing a means to apply energy with high spatial and temporal resolution. In the present study we use finite element multiphysics simulations to predict the effects of laser mode (continuous-wave vs. pulsed) and thermal conductivity of the supporting substrate on the local np-Au film temperatures during photothermal annealing. Based on these results we discuss the mechanisms by which the np-Au network is coarsened. Thermal transport simulations predict that continuous-wave mode laser irradiation of np-Au thin films on a silicon substrate supports the widest range of morphologies that can be created through photothermal annealing of np-Au. Using the guidance provided by simulations, we successfully fabricate an on-chip material library consisting of 81 np-Au samples of 9 different morphologies for use in the parallel study of structure–property relationships.

Graphical abstract: Engineering on-chip nanoporous gold material libraries via precision photothermal treatment

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Publication details

The article was received on 08 Jul 2015, accepted on 15 Sep 2015 and first published on 28 Sep 2015


Article type: Paper
DOI: 10.1039/C5NR04580K
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Citation: Nanoscale, 2016,8, 785-795
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    Engineering on-chip nanoporous gold material libraries via precision photothermal treatment

    C. A. R. Chapman, L. Wang, J. Biener, E. Seker, M. M. Biener and M. J. Matthews, Nanoscale, 2016, 8, 785
    DOI: 10.1039/C5NR04580K

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