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Paper

High-speed photographic analysis of microwave plasma torch source behaviour

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Corresponding authors
a
Research Center for Analytical Instrumentation, Institute of Cyber-Systems and Control, College of Control Science and Engineering, Zhejiang University, Hangzhou 310058, P. R. China
E-mail: jinweimy@zju.edu.cn
b
Zhejiang Supcon Research Co., Ltd., Hangzhou 310058, P. R. China
J. Anal. At. Spectrom., 2016,31, 759-766

DOI: 10.1039/C5JA00483G
Received 10 Dec 2015, Accepted 12 Jan 2016
First published online 12 Jan 2016
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