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Volume 191, 2016
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Self-folding nanostructures with imprint patterned surfaces (SNIPS)

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Abstract

A significant need in nanotechnology is the development of methods to mass-produce three-dimensional (3D) nanostructures and their ordered assemblies with patterns of functional materials such as metals, ceramics, device grade semiconductors, and polymers. While top-down lithography approaches can enable heterogeneous integration, tunability, and significant material versatility, these methods enable inherently two-dimensional (2D) patterning. Bottom-up approaches enable mass-production of 3D nanostructures and their assemblies but with limited precision, and tunability in surface patterning. Here, we demonstrate a methodology to create Self-folding Nanostructures with Imprint Patterned Surfaces (SNIPS). By a variety of examples, we illustrate that SNIPS, either individually or in ordered arrays, are mass-producible and have significant tunability, material heterogeneity, and patterning precision.

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Publication details

The article was received on 22 Feb 2016, accepted on 24 Feb 2016 and first published on 02 Mar 2016


Article type: Paper
DOI: 10.1039/C6FD00021E
Citation: Faraday Discuss., 2016,191, 61-71
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    Self-folding nanostructures with imprint patterned surfaces (SNIPS)

    H. R. Kwag, J. Cho, S. Park, J. Park and D. H. Gracias, Faraday Discuss., 2016, 191, 61
    DOI: 10.1039/C6FD00021E

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