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Issue 30, 2016
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Formation of defect-fluorite structured NdNiOxHy epitaxial thin films via a soft chemical route from NdNiO3 precursors

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Abstract

A new phase of oxyhydride NdNiOxHy with a defect-fluorite structure was obtained by a soft chemical reaction of NdNiO3 epitaxial thin films on a substrate of SrTiO3 (100) with CaH2. The epitaxial relationship of this phase relative to SrTiO3 could be controlled by changing the reaction temperature. At 240 °C, NdNiOxHy grew with a [001] orientation, forming a thin layer of infinite-layer NdNiO2 at the interface between the NdNiOxHy and the substrate. Meanwhile, a high-temperature reaction at 400 °C formed [110]-oriented NdNiOxHy without NdNiO2.

Graphical abstract: Formation of defect-fluorite structured NdNiOxHy epitaxial thin films via a soft chemical route from NdNiO3 precursors

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Publication details

The article was received on 03 May 2016, accepted on 01 Jul 2016 and first published on 01 Jul 2016


Article type: Paper
DOI: 10.1039/C6DT01737A
Citation: Dalton Trans., 2016,45, 12114-12118
  • Open access: Creative Commons BY license
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    Formation of defect-fluorite structured NdNiOxHy epitaxial thin films via a soft chemical route from NdNiO3 precursors

    T. Onozuka, A. Chikamatsu, T. Katayama, T. Fukumura and T. Hasegawa, Dalton Trans., 2016, 45, 12114
    DOI: 10.1039/C6DT01737A

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