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Issue 57, 2016
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Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

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Abstract

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation. The removal of surface states reduces the overpotential and decreases the density of surface recombination centers, resulting in enhanced activity through effective utilization of photogenerated charge carriers.

Graphical abstract: Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

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Publication details

The article was received on 23 Apr 2016, accepted on 03 Jun 2016 and first published on 03 Jun 2016


Article type: Communication
DOI: 10.1039/C6CC03411J
Citation: Chem. Commun., 2016,52, 8806-8809
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    Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

    P. Zhang, T. Wang and J. Gong, Chem. Commun., 2016, 52, 8806
    DOI: 10.1039/C6CC03411J

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