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Issue 33, 2015
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Pore-free bubbling delamination of chemical vapor deposited graphene from copper foils

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Abstract

The electrolytic bubbling-assisted transfer of graphene from metal catalysts in chemical vapor deposition provides a high efficiency, low cost and environmental benign alternative to the traditional chemical etching method. Despite its high potential, the yield of bubbling delamination is yet low, mainly due to the induced pores in the graphene after the transfer. It is found that water and protons transported through the poly(methyl methacrylate) (PMMA) supporting layer play a critical role in pore formation. Once water and protons reach the PMMA–graphene interface before delamination is finished, the protons permeate the graphene and form trapped hydrogen bubbles between the graphene and the metal. The built-up gas pressure inside the bubbles is high enough to crack the PMMA/graphene sheet, thereby creating pores in the graphene. An optimized PMMA layer not only reduces trapped hydrogen bubble generation, but it is also mechanically stronger preventing cracking. This contributes significantly to the pore-free electrolytic bubbling-assisted delamination of graphene.

Graphical abstract: Pore-free bubbling delamination of chemical vapor deposited graphene from copper foils

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Publication details

The article was received on 15 Jun 2015, accepted on 23 Jul 2015 and first published on 24 Jul 2015


Article type: Paper
DOI: 10.1039/C5TC01771H
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Citation: J. Mater. Chem. C, 2015,3, 8634-8641
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    Pore-free bubbling delamination of chemical vapor deposited graphene from copper foils

    Z. Zhan, J. Sun, L. Liu, E. Wang, Y. Cao, N. Lindvall, G. Skoblin and A. Yurgens, J. Mater. Chem. C, 2015, 3, 8634
    DOI: 10.1039/C5TC01771H

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