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Issue 21, 2015
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Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules

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Abstract

Thiol-based chemistry provides a mild and versatile tool for surface functionalization. In the present work, mercaptosilane films were patterned by utilizing UV-induced photo-oxidation of the thiol to yield sulfonate groups via contact and interferometric lithography (IL). These photo-generated sulfonic acid groups were used for selective immobilization of amino-functionalized molecules after activation with triphenylphosphine ditriflate (TPPDF). Moreover, protein-resistant poly(oligoethyleneglycolmethacrylate) (POEGMA) brushes were grown from the intact thiol groups by a surface-induced polymerization reaction. Exploiting both reactions it is possible to couple amino-labelled nitrilotriacetic acid (NH2-NTA) to sulfonate-functionalized regions, enabling the site-specific binding of green fluorescent protein (GFP) to regions defined lithographically, while exploiting the protein-resistant character of POEGMA brushes to prevent non-specific protein adsorption to previously masked areas. The outstanding reactivity of thiol groups paves the way towards novel strategies for the fabrication of complex protein nanopatterns beyond thiol–ene chemistry.

Graphical abstract: Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules

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Publication details

The article was received on 18 Feb 2015, accepted on 30 Apr 2015 and first published on 01 May 2015


Article type: Paper
DOI: 10.1039/C5TB00345H
Citation: J. Mater. Chem. B, 2015,3, 4431-4438
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    Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules

    F. H. Mostegel, R. E. Ducker, P. H. Rieger, O. El Zubir, S. Xia, S. V. Radl, M. Edler, M. L. Cartron, C. N. Hunter, G. J. Leggett and T. Griesser, J. Mater. Chem. B, 2015, 3, 4431
    DOI: 10.1039/C5TB00345H

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