Issue 119, 2015

Poly(sodium-4-styrene sulfonate) (PSSNa)-assisted transferable flexible, top-contact high-resolution free-standing organic field-effect transistors

Abstract

The development of high-integration, flexible and transferable devices is a very important premise to realize authentically wearable applications in the future. Here, we report how to fabricate flexible, free-standing and high-resolution (down to 5 μm) top-contact OFETs based on a polystyrene (PS) dielectric layer. In this process, we use a special sacrificial layer, poly(sodium-4-styrene sulfonate) (PSSNa). It is low-cost, dissolves quickly in water at room temperature and has good compatibility with most organic material processing techniques. With the help of this sacrificial layer, this kind of free-standing transistors can be successfully transferred onto arbitrary substrates. Furthermore, the degradation of the performance of the devices after multiple and successive transfer is tolerated.

Graphical abstract: Poly(sodium-4-styrene sulfonate) (PSSNa)-assisted transferable flexible, top-contact high-resolution free-standing organic field-effect transistors

Supplementary files

Article information

Article type
Communication
Submitted
14 Oct 2015
Accepted
09 Nov 2015
First published
11 Nov 2015

RSC Adv., 2015,5, 98288-98292

Author version available

Poly(sodium-4-styrene sulfonate) (PSSNa)-assisted transferable flexible, top-contact high-resolution free-standing organic field-effect transistors

D. Ji, A. D. Donner, G. Wilde, W. Hu and H. Fuchs, RSC Adv., 2015, 5, 98288 DOI: 10.1039/C5RA21329K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements