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Issue 15, 2015
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Block copolymer self-assembly for nanophotonics

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Abstract

The ability to control and modulate the interaction of light with matter is crucial to achieve desired optical properties including reflection, transmission, and selective polarization. Photonic materials rely upon precise control over the composition and morphology to establish periodic interactions with light on the wavelength and sub-wavelength length scales. Supramolecular assembly provides a natural solution allowing the encoding of a desired 3D architecture into the chemical building blocks and assembly conditions. The compatibility with solution processing and low-overhead manufacturing is a significant advantage over more complex approaches such as lithography or colloidal assembly. Here we review recent advances on photonic architectures derived from block copolymers and highlight the influence and complexity of processing pathways. Notable examples that have emerged from this unique synthesis platform include Bragg reflectors, antireflective coatings, and chiral metamaterials. We further predict expanded photonic capabilities and limits of these approaches in light of future developments of the field.

Graphical abstract: Block copolymer self-assembly for nanophotonics

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Publication details

The article was received on 24 Dec 2014 and first published on 09 Apr 2015


Article type: Review Article
DOI: 10.1039/C4CS00517A
Citation: Chem. Soc. Rev., 2015,44, 5076-5091
  • Open access: Creative Commons BY license
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    Block copolymer self-assembly for nanophotonics

    M. Stefik, S. Guldin, S. Vignolini, U. Wiesner and U. Steiner, Chem. Soc. Rev., 2015, 44, 5076
    DOI: 10.1039/C4CS00517A

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      [Original citation] - Published by The Royal Society of Chemistry.

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