Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance upgrade on Thursday 4th of May 2017 from 8.00am to 9.00am (BST).

During this time our websites will be offline temporarily. If you have any questions please use the feedback button on this page. We apologise for any inconvenience this might cause and thank you for your patience.


Issue 11, 2015
Previous Article Next Article

Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

Author affiliations

Abstract

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.

Graphical abstract: Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

Back to tab navigation
Please wait while Download options loads

Supplementary files

Publication details

The article was received on 23 Sep 2014, accepted on 15 Dec 2014 and first published on 15 Dec 2014


Article type: Communication
DOI: 10.1039/C4CC07494G
Citation: Chem. Commun., 2015,51, 2060-2063
  •   Request permissions

    Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

    A. W. H. Lee, B. K. Pilapil, H. W. Ng and B. D. Gates, Chem. Commun., 2015, 51, 2060
    DOI: 10.1039/C4CC07494G

Search articles by author