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Issue 86, 2015
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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

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Abstract

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300–450 °C) without using a template or anneal.

Graphical abstract: Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

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Publication details

The article was received on 26 Jun 2015, accepted on 07 Sep 2015 and first published on 07 Sep 2015


Article type: Communication
DOI: 10.1039/C5CC05272F
Citation: Chem. Commun., 2015,51, 15692-15695
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    Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

    A. Delabie, M. Caymax, B. Groven, M. Heyne, K. Haesevoets, J. Meersschaut, T. Nuytten, H. Bender, T. Conard, P. Verdonck, S. Van Elshocht, S. De Gendt, M. Heyns, K. Barla, I. Radu and A. Thean, Chem. Commun., 2015, 51, 15692
    DOI: 10.1039/C5CC05272F

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