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Issue 8, 2014
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Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

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Abstract

The first demonstration of a molecularly imprinted polymer patterned by electron beam lithography (EBL) direct writing is reported. The polymeric mixture is based on a linear co-polymer that behaves simultaneously as a positive-tone EBL resist and, after polymerization in the presence of rhodamine 123 (R123) as a model analyte, as a selective and sensitive synthetic receptor for the template. Analyte binding was evaluated by fluorescence confocal microscopy and the imprinting effect was confirmed in the presence of compounds structurally related to R123.

Graphical abstract: Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

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Publication details

The article was received on 01 Aug 2013, accepted on 29 Dec 2013 and first published on 07 Jan 2014


Article type: Communication
DOI: 10.1039/C3TC31499E
Citation: J. Mater. Chem. C, 2014,2, 1400-1403
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    Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

    S. Carrasco, V. Canalejas-Tejero, F. Navarro-Villoslada, C. A. Barrios and M. C. Moreno-Bondi, J. Mater. Chem. C, 2014, 2, 1400
    DOI: 10.1039/C3TC31499E

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