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Issue 14, 2014
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Combinatorial aerosol assisted chemical vapour deposition of a photocatalytic mixed SnO2/TiO2 thin film

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Abstract

Combinatorial Aerosol Assisted Chemical Vapour Deposition (cAACVD) was used to grow a thin film that graduated across its width from tin dioxide to titanium dioxide. This is a relatively new technique that can be used to create a variety of mixed phase and composition thin films on a single substrate. Here cAACVD was used to deposit a mixed phase TiO2 and SnO2 film and composition was related to UV photocatalysis, hydrophobicity and microstructure not inherent to anatase TiO2 or cassiterite SnO2. Characterisation was achieved using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX) and UV-Vis spectroscopy. Functional testing to elucidate the differences in functional properties across the film was undertaken by the photo-induced degradation of a resazurin ‘intelligent’ ink, a photo-induced wettability study and two-point resistivity measurements. Functional properties showed enhanced photocatalysis in comparison to Pilkington Activ™ with similar formal quantum yield (molecules destroyed per absorbed photon) and formal quantum efficiency (molecules destroyed per incident photon) values.

Graphical abstract: Combinatorial aerosol assisted chemical vapour deposition of a photocatalytic mixed SnO2/TiO2 thin film

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Publication details

The article was received on 30 Jan 2014, accepted on 17 Feb 2014 and first published on 19 Feb 2014


Article type: Paper
DOI: 10.1039/C4TA00545G
Author version available: Download Author version (PDF)
Citation: J. Mater. Chem. A, 2014,2, 5108-5116
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    Combinatorial aerosol assisted chemical vapour deposition of a photocatalytic mixed SnO2/TiO2 thin film

    N. Chadwick, S. Sathasivam, A. Kafizas, S. M. Bawaked, A. Y. Obaid, S. Al-Thabaiti, S. N. Basahel, I. P. Parkin and C. J. Carmalt, J. Mater. Chem. A, 2014, 2, 5108
    DOI: 10.1039/C4TA00545G

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