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Paper

Comparison of blend morphologies of the nano-patterned photoactive films via two different techniques: thermal-assisted and solvent-assisted soft-nanoimprint lithography

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a
Department of Chemical and Biomolecular Engineering (BK21), Korea Advanced Institute of Technology, Daejeon, Korea
E-mail: Heetae@Kaist.ac.kr;
Fax: +82 42 350 3910 ;
Tel: +82 42 350 3971
b
Corporate R&D Center, SK Innovation, 140-1 Wonchon-dong, Yuseong-gu, Daejeon 305-712, Korea
E-mail: jeanjk@sk.com;
Fax: +82 42 350 3910 ;
Tel: +82 42 350 3971
RSC Adv., 2014,4, 12302-12308

DOI: 10.1039/C3RA46489J
Received 08 Nov 2013, Accepted 11 Feb 2014
First published online 14 Feb 2014
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