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Issue 13, 2014
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High-yield fabrication of nm-size gaps in monolayer CVD graphene

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Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.

Graphical abstract: High-yield fabrication of nm-size gaps in monolayer CVD graphene

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The article was received on 04 Apr 2014, accepted on 18 May 2014 and first published on 22 May 2014

Article type: Communication
DOI: 10.1039/C4NR01838A
Author version available: Download Author version (PDF)
Citation: Nanoscale, 2014,6, 7249-7254
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    High-yield fabrication of nm-size gaps in monolayer CVD graphene

    C. Nef, L. Pósa, P. Makk, W. Fu, A. Halbritter, C. Schönenberger and M. Calame, Nanoscale, 2014, 6, 7249
    DOI: 10.1039/C4NR01838A

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