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Sub-30 nm thick plasmonic films and structures with ultralow loss

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Corresponding authors
Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 3 Research Link, Singapore
Japan Graduate school of Engineering, University of Hyogo, 2167 Shosha, Himeji, Japan
Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore
Nanoscale, 2014,6, 3243-3249

DOI: 10.1039/C3NR05502G
Received 16 Oct 2013, Accepted 10 Dec 2013
First published online 19 Dec 2013
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