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Issue 5, 2014
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Enhanced stability of cobalt catalysts by atomic layer deposition for aqueous-phase reactions

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Abstract

A thin atomic layer deposition (ALD) TiO2 coating successfully stabilizes cobalt particles supported on TiO2 for aqueous-phase hydrogenation (APH) reactions by preventing leaching and sintering of cobalt. The uncoated conventional cobalt catalysts leach under the same conditions. Using Al2O3 coating of Co/γ-Al2O3 causes the formation of an irreducible cobalt aluminate phase which has no catalytic activity. The ALD TiO2 decorated cobalt catalyst is active for APH of a range of feedstocks including furfuryl alcohol, furfural, and xylose whereas classic non-ALD cobalt catalysts have very low activity for these reactions.

Graphical abstract: Enhanced stability of cobalt catalysts by atomic layer deposition for aqueous-phase reactions

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Publication details

The article was received on 30 Jan 2014, accepted on 24 Mar 2014 and first published on 25 Mar 2014


Article type: Communication
DOI: 10.1039/C4EE00379A
Citation: Energy Environ. Sci., 2014,7, 1657-1660
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    Enhanced stability of cobalt catalysts by atomic layer deposition for aqueous-phase reactions

    J. Lee, D. H. K. Jackson, T. Li, R. E. Winans, J. A. Dumesic, T. F. Kuech and G. W. Huber, Energy Environ. Sci., 2014, 7, 1657
    DOI: 10.1039/C4EE00379A

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