Issue 38, 2014

Epitaxial growth of a self-separated GaN crystal by using a novel high temperature annealing porous template

Abstract

In this paper, a MOCVD-GaN/Al2O3 (MGA) template was annealed under appropriate annealing conditions and N2 flow to form a porous template. The porous template was used for growing GaN by HVPE. The GaN crystal was easily separated from the porous template with the assistance of the microporous structure. The self-separated GaN crystal grown on the porous template showed a smaller full width at half maximum (FWHM) for (002) and (102) reflections in the HRXRD measurement than that grown on the MGA template. The PL results indicate that the optical quality of the GaN crystal on the porous template was improved and the dislocation density decreased. The Raman results showed that the stress in the GaN crystal grown on the porous template is much smaller than that on the MGA template. These results show that the crystalline quality of GaN crystals was improved by using the porous template.

Graphical abstract: Epitaxial growth of a self-separated GaN crystal by using a novel high temperature annealing porous template

Article information

Article type
Paper
Submitted
10 Jun 2014
Accepted
05 Aug 2014
First published
05 Aug 2014

CrystEngComm, 2014,16, 9063-9068

Author version available

Epitaxial growth of a self-separated GaN crystal by using a novel high temperature annealing porous template

L. Zhang, Y. Dai, Y. Wu, Y. Shao, Y. Tian, Q. Huo, X. Hao, Y. Shen and Z. Hua, CrystEngComm, 2014, 16, 9063 DOI: 10.1039/C4CE01188K

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