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Chemical Communications

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Lithography-assisted alignment control for preparation of mesoporous silica films with uniaxially oriented mesochannels

Corresponding authors
World Premier International (WPI) Research Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Japan
E-mail: Yamauchi.Yusuke@nims.go.jp
Faculty of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Japan
Precursory Research for Embryonic Science and Technology (PRESTO), Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Japan
International Center for Young Scientists (ICYS), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Ibaraki 305-0047, Japan
Department of Chemical Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: kevinwu@ntu.edu.tw
Chem. Commun., 2014,50, 2448-2450

DOI: 10.1039/C3CC47667G
Received 06 Oct 2013, Accepted 16 Dec 2013
First published online 23 Jan 2014
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