Issue 19, 2014
From the journal:

Chemical Communications

Lithography-assisted alignment control for preparation of mesoporous silica films with uniaxially oriented mesochannels†

Yusuke Yamauchi,*abc   Shinsuke Ishihara,a   Norihiro Suzukid  and  Kevin C. W. Wu*e  

* Corresponding authors

a World Premier International (WPI) Research Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
E-mail: Yamauchi.Yusuke@nims.go.jp

b Faculty of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan

c Precursory Research for Embryonic Science and Technology (PRESTO), Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan

d International Center for Young Scientists (ICYS), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Ibaraki 305-0047, Tsukuba, Japan

e Department of Chemical Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: kevinwu@ntu.edu.tw

Abstract

We report the lithography-assisted alignment control of one-dimensional (1D) mesochannels. The effectiveness on both nonionic and cationic surfactants is discussed, and a continuous film with fully uniaxially oriented mesochannels is also successfully prepared.

Graphical abstract: Lithography-assisted alignment control for preparation of mesoporous silica films with uniaxially oriented mesochannels

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Article information

DOI
https://doi.org/10.1039/C3CC47667G
Article type
Communication
Submitted
06 Oct 2013
Accepted
16 Dec 2013
First published
23 Jan 2014

Chem. Commun., 2014,50, 2448-2450

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Lithography-assisted alignment control for preparation of mesoporous silica films with uniaxially oriented mesochannels

Y. Yamauchi, S. Ishihara, N. Suzuki and K. C. W. Wu, Chem. Commun., 2014, 50, 2448 DOI: 10.1039/C3CC47667G

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