Jump to main content
Jump to site search

Issue 46, 2013
Previous Article Next Article

Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

Author affiliations

Abstract

This feature article provides an overview of several mechanical-based micro- and nanopatterning technologies that can achieve continuous and high-throughput fabrication of various sub-wavelength structures without resorting to the conventional optical lithography technique. These include a template-based and versatile roll-to-roll nanoimprint lithography technique, cost-effective dynamic mould sweeping patterning as well as mould-free patterning methods. Examples of demonstrated and potential applications in optoelectronics and photonics are also discussed.

Graphical abstract: Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

Back to tab navigation

Publication details

The article was received on 15 May 2013, accepted on 18 Jul 2013 and first published on 18 Jul 2013


Article type: Feature Article
DOI: 10.1039/C3TC30908H
Citation: J. Mater. Chem. C, 2013,1, 7681-7691
  •   Request permissions

    Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

    J. G. Ok, S. H. Ahn, M. K. Kwak and L. J. Guo, J. Mater. Chem. C, 2013, 1, 7681
    DOI: 10.1039/C3TC30908H

Search articles by author

Spotlight

Advertisements