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Feature Article

Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

Jong G. Ok,ab   Se Hyun Ahn,a   Moon Kyu Kwakbc and   L. Jay Guo*ab  
Corresponding authors
Department of Mechanical Engineering, University of Michigan, Ann Arbor, USA
Fax: +1 734 763 9324
Tel: +1 734 647 7718
Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, USA
School of Mechanical Engineering, Kyungpook National University, Daegu 702-701, Republic of Korea
J. Mater. Chem. C, 2013,1, 7681-7691

DOI: 10.1039/C3TC30908H
Received 15 May 2013, Accepted 18 Jul 2013
First published online 18 Jul 2013

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Journal of Materials Chemistry C - Information Point