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Issue 11, 2013
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Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

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Abstract

Block copolymers with metals confined in one or more blocks are emerging as candidate materials for nanomanufacturing applications due to their unprecedented nanoscale pattern transfer capabilities. In this article we highlight recent developments in metal-containing block copolymers in terms of their novel synthetic methodologies with particular emphasis on sequential infiltration synthesis, their hierarchical self-assembly from nano, meso, and submicron scales, and their applications as an etch mask for high-throughput, high-aspect-ratio nano and meso scale patterning.

Graphical abstract: Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

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Publication details

The article was received on 25 Dec 2012, accepted on 21 Jan 2013 and first published on 21 Jan 2013


Article type: Highlight
DOI: 10.1039/C3TC00930K
Citation: J. Mater. Chem. C, 2013,1, 2080-2091
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    Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

    M. Ramanathan, Y. Tseng, K. Ariga and S. B. Darling, J. Mater. Chem. C, 2013, 1, 2080
    DOI: 10.1039/C3TC00930K

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