Jump to main content
Jump to site search

Issue 7, 2013
Previous Article Next Article

One-step preparation of UV transparent highly ordered mesoporous zirconia thin films

Author affiliations

Abstract

Highly ordered mesoporous ZrO2 thin films were prepared by evaporation induced self-assembly. Complexing agents and low pH were simultaneously employed in order to control the hydrolysis–condensation kinetics, permitting to cast films in one step. Many commercially available PPO-based surfactants can be used as templates, yielding different pore sizes. The mesoporosity is well preserved at high temperatures (600 °C) and after exposing the films to extreme alkaline conditions (1 M NaOH, 18 h). The procedure has been used to cast multilayer films, paving the way to mesoporous thin films-based UV photonics.

Graphical abstract: One-step preparation of UV transparent highly ordered mesoporous zirconia thin films

Back to tab navigation

Supplementary files

Publication details

The article was received on 02 Oct 2012, accepted on 04 Dec 2012 and first published on 05 Dec 2012


Article type: Paper
DOI: 10.1039/C2TC00319H
Citation: J. Mater. Chem. C, 2013,1, 1359-1367
  •   Request permissions

    One-step preparation of UV transparent highly ordered mesoporous zirconia thin films

    A. Zelcer and G. J. A. A. Soler-Illia, J. Mater. Chem. C, 2013, 1, 1359
    DOI: 10.1039/C2TC00319H

Search articles by author

Spotlight

Advertisements