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Issue 37, 2013
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Precise structural investigation of symmetric diblock copolymer thin films with resonant soft X-ray reflectivity

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Abstract

Symmetric diblock copolymers are known to form lamellar structures in the bulk of an organic thin film. Polymer/polymer and polymer/substrate interfaces play a critical role in this application. Here, we report the investigation of multiple buried interfaces by using a novel technique resonant soft X-ray reflectivity which benefits from enhanced contrast between different polymers near the carbon K-edge. This allows us to obtain a precise interface structure. We also present an alternative method to determine optical constants of polymers by fitting X-ray reflectivity of polymers with known structural parameters at specific soft X-ray energies. This approach is compared with the way of obtaining β by NEXAFS and calculating δ via the Kramers–Kronig relationship. Finally, by using the determined index of refraction, the precise structure of a multilayer formed by a diblock copolymer is obtained by successfully fitting the resonant soft X-ray reflectivity profile.

Graphical abstract: Precise structural investigation of symmetric diblock copolymer thin films with resonant soft X-ray reflectivity

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Publication details

The article was received on 09 Apr 2013, accepted on 24 Jul 2013 and first published on 25 Jul 2013


Article type: Communication
DOI: 10.1039/C3SM50976A
Citation: Soft Matter, 2013,9, 8820-8825
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    Precise structural investigation of symmetric diblock copolymer thin films with resonant soft X-ray reflectivity

    W. Ma, B. Vodungbo, K. Nilles, Y. Liu, P. Theato and J. Luning, Soft Matter, 2013, 9, 8820
    DOI: 10.1039/C3SM50976A

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