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Directed self-assembly of block copolymers for universal nanopatterning

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Corresponding authors
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Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Department of Materials Science and Engineering, KAIST, Daejeon, Republic of Korea
E-mail: sangouk.kim@kaist.ac.kr
Fax: +82 42 350 3310
Tel: +82 42 350 3339
Soft Matter, 2013,9, 2780-2786

DOI: 10.1039/C2SM27535J
Received 04 Nov 2012, Accepted 03 Jan 2013
First published online 01 Feb 2013

This article is part of themed collection: 2013’s most accessed Soft Matter articles
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