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Issue 6, 2013
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Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography

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Abstract

We describe a highly efficient method for fabricating a variety of complex 3D nano-patterns from a single master pattern using secondary sputtering lithography, which is a 10 nm scale patterning method that we have developed. A rapid etching rate in the bottom part of the PS pillar during the RIE process can produce various nanostructure shapes and the PS residual layer thickness can influence various feature dimensions, due to the controlled RIE time leading to different PS layer thicknesses. This technique provides a highly effective method for producing various complex 3D patterns from a single master pattern. Thus, this method can serve as a new procedure for the cost-effective mass production of complex nanoscale patterns with high resolution.

Graphical abstract: Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography

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Publication details

The article was received on 20 Nov 2012, accepted on 14 Jan 2013 and first published on 17 Jan 2013


Article type: Paper
DOI: 10.1039/C3NR33739A
Citation: Nanoscale, 2013,5, 2358-2363
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    Fabrication of complex 3-dimensional patterned structures on a ∼10 nm scale from a single master pattern by secondary sputtering lithography

    H. Jeon, H. Yoo, E. H. Lee, S. W. Jang, J. Kim, J. K. Choi and H. Jung, Nanoscale, 2013, 5, 2358
    DOI: 10.1039/C3NR33739A

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