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Issue 7, 2013
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The extended growth of graphene oxide flakes using ethanol CVD

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Abstract

We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD). GO was used to catalyze the deposition of carbon on a substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS and AFM characterized the growth to be a reduced GO (RGO) of <5 layers. This newly grown RGO possesses lower defect density with larger and increased distribution of sp2 domains than chemically reduced RGO. Furthermore this method without optimization reduces the relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical electronic devices.

Graphical abstract: The extended growth of graphene oxide flakes using ethanol CVD

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Publication details

The article was received on 19 Nov 2012, accepted on 03 Feb 2013 and first published on 06 Feb 2013


Article type: Paper
DOI: 10.1039/C3NR33704A
Citation: Nanoscale, 2013,5, 2945-2951
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    The extended growth of graphene oxide flakes using ethanol CVD

    J. Huang, M. Larisika, W. H. D. Fam, Q. He, M. A. Nimmo, C. Nowak and I. Y. A. Tok, Nanoscale, 2013, 5, 2945
    DOI: 10.1039/C3NR33704A

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