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A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology


Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices

Corresponding authors
Kavli Nanoscience Institute, California Institute of Technology, 1200 E. California Blvd., MC 200-36, Pasadena, USA
E-mail: walavalk@caltech.edu
Tel: +1 626 395 4578
MESA Facility, Sandia National Labs, P.O. Box 5800, Albuquerque, USA
Nanoscale, 2013,5, 927-931

DOI: 10.1039/C2NR32981F
Received 28 Sep 2012, Accepted 11 Dec 2012
First published online 13 Dec 2012
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Supplementary Info