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A growth mechanism for graphene deposited on polycrystalline Co film by plasma enhanced chemical vapor deposition

Corresponding authors
Department of Materials Science, Key Laboratory of Mobile Materials, MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, People's Republic of China
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Tel: +86 431 85168246
College of Science, Changchun University, Changchun 130022, People's Republic of China
Light Industry College of Liaoning University, Shenyang, People's Republic of China
New J. Chem., 2013,37, 1616-1622

DOI: 10.1039/C3NJ41136B
Received 14 Dec 2012, Accepted 11 Mar 2013
First published online 13 Mar 2013
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