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Issue 26, 2013
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Aerosol-assisted delivery of precursors for chemical vapour deposition: expanding the scope of CVD for materials fabrication

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Abstract

The production of thin films of materials has become the attention of a great deal of research throughout academia and industry worldwide owing to the array of applications which utilise them, including electronic devices, gas sensors, solar cells, window coatings and catalytic systems. Whilst a number of deposition techniques are in common use, chemical vapour deposition (CVD) is an attractive process for the production of a wide range of materials due to the control it offers over film composition, coverage and uniformity, even on large scales. Conventional CVD processes can be limited, however, by the need for suitably volatile precursors. Aerosol-assisted (AA)CVD is a solution-based process which relies on the solubility of the precursor, rather than its volatility and thus vastly extends the range of potentially applicable precursors. In addition, AACVD offers extra means to control film morphology and concurrently the properties of the deposited materials. In this perspective we discuss the AACVD process, the influence of deposition conditions on film characteristics and a number of materials and applications to which AACVD has been found beneficial.

Graphical abstract: Aerosol-assisted delivery of precursors for chemical vapour deposition: expanding the scope of CVD for materials fabrication

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Publication details

The article was received on 05 Mar 2013, accepted on 11 Apr 2013 and first published on 15 Apr 2013


Article type: Perspective
DOI: 10.1039/C3DT50607J
Citation: Dalton Trans., 2013,42, 9406-9422
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    Aerosol-assisted delivery of precursors for chemical vapour deposition: expanding the scope of CVD for materials fabrication

    P. Marchand, I. A. Hassan, I. P. Parkin and C. J. Carmalt, Dalton Trans., 2013, 42, 9406
    DOI: 10.1039/C3DT50607J

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