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Communication

A novel planarization method based on photoinduced confined chemical etching

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Corresponding authors
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State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China
E-mail: jzzhou@xmu.edu.cn
Fax: +86 592 2183407
Tel: +86 592 2189663
Chem. Commun., 2013,49, 6451-6453

DOI: 10.1039/C3CC42368A
Received 01 Apr 2013, Accepted 24 May 2013
First published online 28 May 2013
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