Issue 3, 2012

A new route to nanostructured thermosets with block ionomer complexes

Abstract

We report a novel approach to prepare nanostructured thermosets using block ionomer complexes. Neither block copolymer polystyrene-block-poly(ethylene-ran-butylene)-block-polystyrene (SEBS) nor block ionomer sulfonated SEBS (SSEBS) is miscible with diglycidyl ether of bisphenol A (DGEBA) type epoxy resin. It is thus surprising that the block ionomer complex of SSEBS with a tertiary amine-terminated poly(ε-caprolactone) (PCL), denoted as SSEBS-c-PCL, can be used to prepare nanostructured epoxy thermosets. The block ionomer complex SSEBS-c-PCL is synthesized via neutralization of SSEBS with 3-dimethylamino-propylamine-terminated PCL. Sulfonation of SEBS yields the block ionomer SSEBS which is immiscible with epoxy. But the block ionomer complex SSEBS-c-PCL can be easily mixed with DGEBA. When the curing agent 4,4′-methylenedianiline (MDA) is added and the epoxy cures, the system retains the nanostructure. In cured epoxy thermosets containing up to 30 wt% SSEBS-c-PCL, the exclusion of the poly(ethylene-ran-butylene) (EB) phase forms spherical micro-domains surrounded by separated sulfonated polystyrene phase while the PCL side-chains of SSEBS-c-PCL are dissolved in the cured epoxy matrix. The spherical micro-domains are highly aggregated in the epoxy thermosets containing 40 and 50 wt% SSEBS-c-PCL. The existence of epoxy-miscible PCL side-chains in the block ionomer complex SSEBS-c-PCL avoids macro-phase separation. Hence, the block ionomer complex can act as an efficient modifier to achieve nanostructured epoxy thermosets.

Graphical abstract: A new route to nanostructured thermosets with block ionomer complexes

Article information

Article type
Paper
Submitted
03 Jul 2011
Accepted
21 Sep 2011
First published
04 Nov 2011

Soft Matter, 2012,8, 688-698

A new route to nanostructured thermosets with block ionomer complexes

S. Wu, S. Peng, N. Hameed, Q. Guo and Y. Mai, Soft Matter, 2012, 8, 688 DOI: 10.1039/C1SM06244A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements